by Opto-Line | Jan 11, 2022 | Company News
The Opto-Line name is synonymous with service. It is our mission to provide you with the best service and quality. It is your satisfaction that has kept us in business for over fifty years. Opto-Line International takes great pride in the high level of quality...
by Opto-Line | Jan 6, 2022 | Company News
Opto-Line International has been creating Custom Precision Patterns on Optics Since 1967. As industry leaders in the manufacturing of precision reticles, we provide companies in the medical, optometry, aerospace, industrial, science and defense sectors with the very...
by Opto-Line | Dec 15, 2021 | Company News, Custom Patterns
Opto-Line patterns on a myriad of substrates including all glass material and other IR materials including geranium, silicon, zinc sulfide, quartz, and sapphire. The largest substrate size that Opto-Line can pattern is approximately 12.5” diagonal. The smallest part...
by Opto-Line | Dec 9, 2021 | Company News, Photoresist Coatings
Whether it be silicon wafers that need a custom resist patterns, a 7” plate, or a Ø10mm concave optic, Opto-Line’s ability to provide photoresist patterns on a multitude of optics is just one factor that makes us stand out. We have many customers that want to utilize...
by Opto-Line | Dec 3, 2021 | Company News, Custom Patterns
Opto-Line will strive to perfect your patterned lens projects. Our photolithography techniques are done with the utmost care and precision. Our team has over 100 years of total experience resulting in a tried and true methodology for delineating your patterns. Click...
by Opto-Line | Nov 23, 2021 | Company News
We help clients craft almost any custom test targets imaginable, meeting all MIL standards. To learn more, reach out to Opto-Line today at (978) 658-7255. Click to learn more about our Resolution Test Targets...
by Opto-Line | Nov 17, 2021 | Company News, Custom Patterns
We are industry leaders in the manufacturing of precision reticles. Opto-Line International’s services include multi-density resolution masks, neutral density filters, reticle patterns, precision apertures, calibration test targets, EMI grids, photolithographic...