Tagged: Photolithography

Precision Patterns + Thin Film Coatings + Quality = A superior product for our clients

April 27th, 2020 | Photolithography

Opto-Line offers custom patterning capabilities include reticles, resolution test targets, EMI grids, apertures, linear scales, and neutral density step tablets. We  can typically tackle any custom pattern imaginable. Combined with our specialized photolithography, Opto-Line utilizes thin film coatings to make your custom patterns. Our high-vacuum evaporation chambers provide us with the ability to precisely deposit […]

Opto-Line’s patterning capabilities, using photolithography with photoresist coatings, is our staple; it is where our experience and techniques outshine our competitors.

February 21st, 2020 | Photolithography

Experience and techniques that outshine the competition Whether it be silicon wafers that need a custom resist patterns, a 7” plate, or a Ø10mm concave optic, Opto-Line’s ability to provide photoresist patterns on a multitude of optics is just one factor that makes us stand out. We have many customers that want to utilize their […]

Thank you to all those who stopped by our booth at SPIE Photonics West in San Francisco where we were able to display a just small sample of the custom precision optical patterning we’ve performed over the years.

February 12th, 2020 | Photolithography

Our blanket photoresist coating services for semiconductor test wafers are processed in a dedicated, class 100 cleanroom. To learn more about Opto-Line’s Photoresist Coating services, please call us today at 978-658-7255.

February 3rd, 2020 | Photolithography

Wafer sizes range from 50mm diameter to 300mm diameter. Coating thicknesses range from 0.5 microns to 10 microns. A photoresist is a light-sensitive material used in several industrial processes, such as photolithography and photoengraving, to form a patterned coating on a surface. Blanket photoresist coatings may also be patterned per customer specifications. Coating thickness and […]

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