Opto-Line International’s services include multi-density resolution masks, neutral density filters, reticle patterns, precision apertures, calibration test targets, EMI grids, photolithographic services, contrast test targets, and many more. Patterns can be made from various materials such as chrome, low-reflecting black chrome, gold, aluminum, SiO2 and more. It is our mission to provide you with the best […]
For over 50 years, the Opto-Line name has been synonymous with service. It is our mission to provide you with the best service and quality and it has been your satisfaction that has kept us in business all these years.
Opto-Line International’s services include multi-density resolution masks, neutral density filters, reticle patterns, precision apertures, calibration test targets, EMI grids, photolithographic services, contrast test targets, and many more. Patterns can be made from various materials such as chrome, low-reflecting black chrome, gold, aluminum, SiO2 and more.
Opto-Line offers the highest quality Multi-Density Resolution Masks that can be fabricated using both halftone or continuous methods. We invite you to reach out to learn more about our services and the markets we serve. Call today – (978) 658-7255.
Opto-Line’s Polka-Dot Beamsplitters are ideal for use with broadband, extended sources, such as tungsten, halogen, deuterium, and xenon lamps, and for use in monochromators, spectrophotometers, and other optical systems.
Opto-Line strives to perfect your patterned lens projects utilizing advanced skills and processing methods. Visit us at opto-line.com to learn more.
As a premier custom reticle company, Opto-Line International can manufacture a multitude of custom patterns on optical substrates to meet the needs of our clients. To learn more, visit us online at opto-line.com.
Opto-Line provides world-class solutions in the area of Research and Development. Our ability to think out of the box and tackle the most complex projects is what makes us the premier reticle vendor to call upon for your R&D needs.