Specializing in custom precision optical patterns for all areas of research and development, Opto-Line helps clients reach their R&D goals. Our custom patterns are often vital components in the R&D phase of a product. We have a long history of partnering with companies across an array of industries to help them achieve their product goals. […]
Opto-Line patterns on a myriad of substrates including all glass material and other IR materials including geranium, silicon, zinc sulfide, quartz, and sapphire. The largest substrate size that Opto-Line can pattern is approximately 12.5” diagonal. The smallest part that can be manufactured is about 1mm x 1mm.
Lens patterning requires advanced skills and processing methods; a service that few can provide. Opto-Line can deliver photoresist patterns on lenses or a full thin film coating patterns. The feature sizes that Opto-Line can handle will strongly depend on the radius of the substrate. Feasibility of each project is reviewed by our team.
Opto-Line offers the highest quality Multi-Density Resolution Masks that can be fabricated using both halftone or continuous methods. We invite you to reach out to learn more about our services and the markets we serve. Call today – (978) 658-7255.
Opto-Line’s Polka-Dot Beamsplitters are ideal for use with broadband, extended sources, such as tungsten, halogen, deuterium, and xenon lamps, and for use in monochromators, spectrophotometers, and other optical systems.
Opto-Line strives to perfect your patterned lens projects utilizing advanced skills and processing methods. Visit us at opto-line.com to learn more.
As a premier custom reticle company, Opto-Line International can manufacture a multitude of custom patterns on optical substrates to meet the needs of our clients. To learn more, visit us online at opto-line.com.
Opto-Line provides world-class solutions in the area of Research and Development. Our ability to think out of the box and tackle the most complex projects is what makes us the premier reticle vendor to call upon for your R&D needs.